Modified developer increases line resolution in photosensitive resist
Overview & Synopsis
Standard developer solution is mixed with dipropyl carbonate. This reduces swelling in the photosensitive resist and permits application of relatively thick films with minimal pinhole formation and increased line resolution.
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ntrs.nasa.gov)
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Document Information
| Document Title | Modified developer increases line resolution in photosensitive resist |
|---|---|
| Author / Organization | National Aeronautics and Space Administration (NASA) |
| Subject & Discipline | OTHER |
| Categories | Aerospace & Aviation |
| Publication Year | 2019 |
| License / Rights | Public Domain / NASA STI Open Access |
| Resource Verification | Listed PDF (Verification Pending) |
| Original Host Website |
NASA Technical Reports Server
(ntrs.nasa.gov)
|
| File Format | application/pdf (Portable Document Format) |
| Language | EN |
| Catalog ID | DOC-80227 |
| Original Source Link | Visit Source Page on ntrs.nasa.gov » |